Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography

Simeng Jia; Emmanuel D. Le Boulbar; Krishna C. Balram; Jon R. Pugh; Tao Wang; Duncan W.E. Allsopp; Philip A. Shields; Martin J. Cryan

doi:10.1049/mnl.2019.0366

Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography

Simeng Jia, Emmanuel D. Le Boulbar, Krishna C. Balram, Jon R. Pugh, Tao Wang, Duncan W.E. Allsopp, Philip A. Shields, Martin J. Cryan

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

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Abstract

This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.

Original language	English
Pages (from-to)	1322-1327
Number of pages	6
Journal	Micro and Nano Letters
Volume	14
Issue number	13
DOIs	https://doi.org/10.1049/mnl.2019.0366
Publication status	Published - 20 Nov 2019

ASJC Scopus subject areas

Bioengineering
Biomedical Engineering
Materials Science(all)
Condensed Matter Physics

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10.1049/mnl.2019.0366

A Waveguide Integrated GaN Distributed Bragg Reflector Cavity Using Low Cost Nanolithography-Simeng Jia
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Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography. / Jia, Simeng; Le Boulbar, Emmanuel D.; Balram, Krishna C.; Pugh, Jon R.; Wang, Tao; Allsopp, Duncan W.E.; Shields, Philip A.; Cryan, Martin J.

In: Micro and Nano Letters, Vol. 14, No. 13, 20.11.2019, p. 1322-1327.

Research output: Contribution to journal › Article › peer-review

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AB - This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.

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Waveguide integrated GaN distributed Bragg reflector cavity using low-cost nanolithography

Abstract

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