Abstract
This work presents the design, fabrication and measurement of gallium nitride (GaN) distributed Bragg reflector cavities integrated with input and output grating couplers. The devices are fabricated using a new, low-cost nanolithography technique: displacement Talbot lithography combined with direct laser writing lithography. The finite-difference time-domain method has been used to design all the components and measured and modelled results show good agreement. Such devices have applications in GaN integrated photonics and biosensing.
Original language | English |
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Pages (from-to) | 1322-1327 |
Number of pages | 6 |
Journal | Micro and Nano Letters |
Volume | 14 |
Issue number | 13 |
DOIs | |
Publication status | Published - 20 Nov 2019 |
ASJC Scopus subject areas
- Bioengineering
- Biomedical Engineering
- Materials Science(all)
- Condensed Matter Physics