Wafer-scale transfer of nanoimprinted patterns into silicon substrates

G Hubbard, S J Abbott, Qin Chen, Duncan W E Allsopp, Wang N Wang, Christopher R Bowen, R Stevens, A Satka, D Hasko, F Uherek, J Kovac

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

A simple low cost method of nanoimprinting has been developed. The technique uses a flexible disposable master and lends itself to roll-to-roll processing. Residual layer thicknesses of 5-10 nm are routinely achieved. This enables the critical step of pattern transfer into hard substrates by reactive ion etching, an essential step in the fabrication of sub-wavelength photonic device elements on a wafer-scale.
Original languageEnglish
Pages (from-to)1118-1121
Number of pages4
JournalPhysica E-Low-Dimensional Systems & Nanostructures
Volume41
Issue number6
Early online date13 Aug 2008
DOIs
Publication statusPublished - May 2009
EventSpring Meeting of the European-Materials-Research-Society on Frontiers in Silicon-Based Photonics - Strasbourg, France
Duration: 8 May 2009 → …

Fingerprint

Photonic devices
Reactive ion etching
Silicon
wafers
Fabrication
Wavelength
silicon
Substrates
Processing
Costs
etching
photonics
fabrication
wavelengths
ions

Keywords

  • Silicon
  • Pattern transfer
  • Nanoimprinting

Cite this

Wafer-scale transfer of nanoimprinted patterns into silicon substrates. / Hubbard, G; Abbott, S J; Chen, Qin; Allsopp, Duncan W E; Wang, Wang N; Bowen, Christopher R; Stevens, R; Satka, A; Hasko, D; Uherek, F; Kovac, J.

In: Physica E-Low-Dimensional Systems & Nanostructures, Vol. 41, No. 6, 05.2009, p. 1118-1121.

Research output: Contribution to journalArticle

Hubbard, G, Abbott, SJ, Chen, Q, Allsopp, DWE, Wang, WN, Bowen, CR, Stevens, R, Satka, A, Hasko, D, Uherek, F & Kovac, J 2009, 'Wafer-scale transfer of nanoimprinted patterns into silicon substrates', Physica E-Low-Dimensional Systems & Nanostructures, vol. 41, no. 6, pp. 1118-1121. https://doi.org/10.1016/j.physe.2008.08.014
Hubbard, G ; Abbott, S J ; Chen, Qin ; Allsopp, Duncan W E ; Wang, Wang N ; Bowen, Christopher R ; Stevens, R ; Satka, A ; Hasko, D ; Uherek, F ; Kovac, J. / Wafer-scale transfer of nanoimprinted patterns into silicon substrates. In: Physica E-Low-Dimensional Systems & Nanostructures. 2009 ; Vol. 41, No. 6. pp. 1118-1121.
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