A simple low cost method of nanoimprinting has been developed. The technique uses a flexible disposable master and lends itself to roll-to-roll processing. Residual layer thicknesses of 5-10 nm are routinely achieved. This enables the critical step of pattern transfer into hard substrates by reactive ion etching, an essential step in the fabrication of sub-wavelength photonic device elements on a wafer-scale.
|Number of pages||4|
|Journal||Physica E-Low-Dimensional Systems & Nanostructures|
|Early online date||13 Aug 2008|
|Publication status||Published - May 2009|
|Event||Spring Meeting of the European-Materials-Research-Society on Frontiers in Silicon-Based Photonics - Strasbourg, France|
Duration: 8 May 2009 → …
- Pattern transfer