Projects per year
Abstract
Displacement Talbot lithography (DTL) is a new technique for patterning large areas with sub-micron periodic features with low cost. It has applications in fields that cannot justify the cost of deep-UV photolithography, such as plasmonics, photonic crystals, and metamaterials and competes with techniques, such as nanoimprint and laser interference lithography. It is based on the interference of coherent light through a periodically patterned photomask. However, the factors affecting the technique’s resolution limit are unknown. Through computer simulations, we show the mask parameter’s impact on the features’ size that can be achieved and describe the separate figures of merit that should be optimized for successful patterning. Both amplitude and phase masks are considered for hexagonal and square arrays of mask openings. For large pitches, amplitude masks are shown to give the best resolution; whereas, for small pitches, phase masks are superior because the required exposure time is shorter. We also show how small changes in the mask pitch can dramatically affect the resolution achievable. As a result, this study provides important information for choosing new masks for DTL for targeted applications.
Original language | English |
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Pages (from-to) | 5918-5930 |
Number of pages | 13 |
Journal | Optics Express |
Volume | 27 |
Issue number | 5 |
Early online date | 20 Feb 2019 |
DOIs | |
Publication status | Published - 4 Mar 2019 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Fingerprint
Dive into the research topics of 'Understanding resolution limit of Displacement Talbot Lithography'. Together they form a unique fingerprint.Projects
- 2 Finished
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Manufacturing of Nano-Engineered III-N Semiconductors
Shields, P. (PI), Allsopp, D. (CoI) & Wang, W. (CoI)
Engineering and Physical Sciences Research Council
1/05/15 → 30/09/21
Project: Research council
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Manufacturing of Nano-Engineered III-N Semiconductors - Equipment
Shields, P. (PI) & Allsopp, D. (CoI)
Engineering and Physical Sciences Research Council
1/02/15 → 31/01/20
Project: Research council
Profiles
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Philip Shields
- Department of Electronic & Electrical Engineering - Senior Lecturer
- Centre for Nanoscience and Nanotechnology
- Centre for Sustainable Chemical Technologies (CSCT)
- Condensed Matter Physics CDT
- Electronics Materials, Circuits & Systems Research Unit (EMaCS)
- Centre for Integrated Materials, Processes & Structures (IMPS)
Person: Research & Teaching, Core staff
Datasets
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Dataset for "Understanding the resolution limit of Displacement Talbot Lithography"
Chausse, P. (Creator), Le Boulbar, E. (Creator), Lis, S. (Creator) & Shields, P. (Creator), University of Bath, 20 Feb 2019
DOI: 10.15125/BATH-00570
Dataset