Ultra-thin oxide films for band engineering: design principles and numerical experiments

Keith T. Butler, Aron Walsh

Research output: Contribution to journalArticle

9 Citations (Scopus)
128 Downloads (Pure)

Abstract

The alignment of band energies between conductive oxides and semiconductors is crucial for the further development of oxide contacting layers in electronic devices. The growth of ultra thin films on the surface of an oxide material can be used to introduce a dipole moment at that surface due to charge differences. The dipole, in turn, alters the electrostatic potential - and hence the band energies - in the substrate oxide. We demonstrate the fundamental limits for the application of thin-films in this context, applying analytical and numerical simulations, that bridge continuum and atomistic. The simulations highlight the different parameters that can affect the band energy shifting potential of a given thin-film layer, taking the examples of MgO and SnO2. In particular we assess the effect of formal charge, layer orientation, layer thickness and surface coverage, with respect to their effect on the electrostatic potential. The results establish some design principles, important for further development and application of thin-films for band energy engineering in transparent conductive oxide materials.
Original languageEnglish
Pages (from-to)64-68
Number of pages5
JournalThin Solid Films
Volume559
Early online date28 Oct 2013
DOIs
Publication statusPublished - 30 May 2014

Fingerprint Dive into the research topics of 'Ultra-thin oxide films for band engineering: design principles and numerical experiments'. Together they form a unique fingerprint.

  • Cite this