Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation

Benjamin Damilano, Pierre Marie Coulon, Stéphane Vézian, Virginie Brändli, Jean Yves Duboz, Jean Massies, Philip A. Shields

Research output: Contribution to journalArticle

Abstract

We show that a 4 μm thick GaN layer grown by metal-organic vapour phase epitaxy can be transformed into a well-organized array of GaN nanowires (NWs) using displacement Talbot lithography and selective area sublimation. The optical quality of the GaN NWs obtained by this method is attested by their room temperature photoluminescence and the observation of lasing under optical pumping with a minimum excitation power density threshold of 2.4 MW cm -2 .

Original languageEnglish
Article number045007
JournalApplied Physics Express
Volume12
Issue number4
Early online date6 Mar 2019
DOIs
Publication statusPublished - 27 Mar 2019

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

Cite this

Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation. / Damilano, Benjamin; Coulon, Pierre Marie; Vézian, Stéphane; Brändli, Virginie; Duboz, Jean Yves; Massies, Jean; Shields, Philip A.

In: Applied Physics Express, Vol. 12, No. 4, 045007, 27.03.2019.

Research output: Contribution to journalArticle

Damilano, Benjamin ; Coulon, Pierre Marie ; Vézian, Stéphane ; Brändli, Virginie ; Duboz, Jean Yves ; Massies, Jean ; Shields, Philip A. / Top-down fabrication of GaN nano-laser arrays by displacement Talbot lithography and selective area sublimation. In: Applied Physics Express. 2019 ; Vol. 12, No. 4.
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