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The response of open-volume defects in Si0.92Ge0.08 to annealing in nitrogen or oxygen ambient

  • D A Abdulmalik
  • , P G Coleman
  • , H Z Su
  • , Y M Haddara
  • , A P Knights

Research output: Contribution to journalArticlepeer-review

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Original languageEnglish
Pages (from-to)753-757
Number of pages5
JournalJournal of Materials Science : Materials in Electronics
Volume18
Issue number7
Publication statusPublished - 2007

Bibliographical note

ID number: ISI:000246175200014

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