The reaction and materials chemistry of [Sn6(O)4 (OSiMe3)4]: Chemical vapour deposition of tin oxide

I. Barbul, A.L. Johnson, Gabriele Kociok-Kohn, K.C. Molloy, C. Silvestru, A.L. Sudlow

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

[Sn6(O4)(OSiMe3)4] and [{Sn(OSiMe3)2}2] have been used to deposit SnO thin films by chemical vapour deposition. Films derived from [Sn6(O)4(OSiMe3)4] comprise uniform cubes and are highly oriented, whereas those deposited from [{Sn(OSiMe3)2}2] are made up of a continuous non-oriented layer with oriented cubes on the surface. The structure of a co-crystal, 2 Sn6(O)4(OSiMe3)4-[Sn(OSiMe3)2]-4 THF, shows that [{Sn(OSiMe3)2}2], a liquid at room temperature, adopts a μ-OSiMe3-bridged dimeric structure. [Sn6(O)4(OSiMe3)4] reacts with O2 in a controlled manner to afford the novel oxo-cluster [Sn4 (O)(OSiMe3)8], the structure of which is reported. In addition, a crystal of {[Sn4(O)(OSiMe3)5]+2[Sn(O)(OSiMe3)4 Cl]+2}[Cl]-4 has been fortuitously isolated from the presence of SnCl2 in the starting material for the preparation of [Sn6(O)4(OSiMe3)4], and has been shown to incorporate two novel cationic oxo-tin clusters.

Original languageEnglish
Pages (from-to)866-874
Number of pages9
JournalChemPlusChem
Volume78
Issue number8
Early online date2 Jul 2013
DOIs
Publication statusPublished - Aug 2013

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