The isolation and structure of a highly stable, metallation-resistant and multiply hydrogen-bonded sulfonylamide-phosphine oxide adduct, PhSO2CH2C(=O)NH2·O=P(NMe 2)3, PSA·HMPA (PSA = phenylsulfonylacetamide, HMPA = hexamethylphosphoramide)

Ian Cragg-Hine, Matthew G. Davidson, Andrew J. Edwards, Elinor Lamb, Paul R. Raithby, Ronald Snaith

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Engineering & Materials Science

Chemical Compounds