The isolation and structure of a highly stable, metallation-resistant and multiply hydrogen-bonded sulfonylamide-phosphine oxide adduct, PhSO2CH2C(=O)NH2·O=P(NMe 2)3, PSA·HMPA (PSA = phenylsulfonylacetamide, HMPA = hexamethylphosphoramide)

Ian Cragg-Hine, Matthew G. Davidson, Andrew J. Edwards, Elinor Lamb, Paul R. Raithby, Ronald Snaith

Research output: Contribution to journalArticlepeer-review


Attempted metallations of the expectedly acidic sulfonylamide (PSA) in the presence of the phosphine oxide HMPA all fail, giving instead the very stable 1:1 adduct PSA·HMPA; its solid-state structure consists of layers of PSA molecules linked by intercalated HMPA molecules, such aggregation resulting in particular from a large number of significant C-H⋯O hydrogen-bonding interactions per PSA·HMPA unit.

Original languageEnglish
Pages (from-to)153-154
Number of pages2
JournalChemical Communications
Issue number2
Publication statusPublished - 31 Dec 1996

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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