Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation

Zhanxiang Zhao, Gin Jose, Paul Steenson, Nikos Bamiedakis, Richard V. Penty, Ian H. White, Animesh Jha

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Erbium-doped tellurite glass thin films were deposited using excimer (193 nm) laser ablation onto two different types of substrates: silica and polymer-coated silica for engineering optical integrated active-passive devices. The deposition conditions were optimized for both substrates in order to produce high-quality rare-earth (Er3+) ion-doped glass thin films with low propagation loss. The optical and spectroscopic properties of the deposited films, namely transmittance, fluorescence, lifetime as well as refractive indices at 633 nm were measured and analysed in detail.

Original languageEnglish
Article number095501
JournalJournal of Physics D: Applied Physics
Volume44
Issue number9
DOIs
Publication statusPublished - 15 Feb 2011

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Acoustics and Ultrasonics
  • Surfaces, Coatings and Films

Cite this

Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation. / Zhao, Zhanxiang; Jose, Gin; Steenson, Paul; Bamiedakis, Nikos; Penty, Richard V.; White, Ian H.; Jha, Animesh.

In: Journal of Physics D: Applied Physics, Vol. 44, No. 9, 095501, 15.02.2011.

Research output: Contribution to journalArticle

Zhao, Zhanxiang ; Jose, Gin ; Steenson, Paul ; Bamiedakis, Nikos ; Penty, Richard V. ; White, Ian H. ; Jha, Animesh. / Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation. In: Journal of Physics D: Applied Physics. 2011 ; Vol. 44, No. 9.
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