Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation

Zhanxiang Zhao; Gin Jose; Paul Steenson; Nikos Bamiedakis; Richard V. Penty; Ian H. White; Animesh Jha

doi:10.1088/0022-3727/44/9/095501

Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation

Zhanxiang Zhao, Gin Jose, Paul Steenson, Nikos Bamiedakis, Richard V. Penty, Ian H. White, Animesh Jha

Vice Chancellor's Office

Research output: Contribution to journal › Article › peer-review

12 Citations (SciVal)

Abstract

Erbium-doped tellurite glass thin films were deposited using excimer (193 nm) laser ablation onto two different types of substrates: silica and polymer-coated silica for engineering optical integrated active-passive devices. The deposition conditions were optimized for both substrates in order to produce high-quality rare-earth (Er³⁺) ion-doped glass thin films with low propagation loss. The optical and spectroscopic properties of the deposited films, namely transmittance, fluorescence, lifetime as well as refractive indices at 633 nm were measured and analysed in detail.

Original language	English
Article number	095501
Journal	Journal of Physics D: Applied Physics
Volume	44
Issue number	9
DOIs	https://doi.org/10.1088/0022-3727/44/9/095501
Publication status	Published - 15 Feb 2011

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Acoustics and Ultrasonics
Surfaces, Coatings and Films

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10.1088/0022-3727/44/9/095501

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abstract = "Erbium-doped tellurite glass thin films were deposited using excimer (193 nm) laser ablation onto two different types of substrates: silica and polymer-coated silica for engineering optical integrated active-passive devices. The deposition conditions were optimized for both substrates in order to produce high-quality rare-earth (Er3+) ion-doped glass thin films with low propagation loss. The optical and spectroscopic properties of the deposited films, namely transmittance, fluorescence, lifetime as well as refractive indices at 633 nm were measured and analysed in detail.",

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AU - Zhao, Zhanxiang

AU - Jose, Gin

AU - Steenson, Paul

AU - Bamiedakis, Nikos

AU - Penty, Richard V.

AU - White, Ian H.

AU - Jha, Animesh

PY - 2011/2/15

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AB - Erbium-doped tellurite glass thin films were deposited using excimer (193 nm) laser ablation onto two different types of substrates: silica and polymer-coated silica for engineering optical integrated active-passive devices. The deposition conditions were optimized for both substrates in order to produce high-quality rare-earth (Er3+) ion-doped glass thin films with low propagation loss. The optical and spectroscopic properties of the deposited films, namely transmittance, fluorescence, lifetime as well as refractive indices at 633 nm were measured and analysed in detail.

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Tellurite glass thin films on silica and polymer using UV (193 nm) pulsed laser ablation

Abstract

ASJC Scopus subject areas

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