Surface functionalization to control the wetting behavior of nanostructured carbons

Davide Mattia, Yury Gogotsi

Research output: Contribution to journalArticle

Abstract

Thin films of C were deposited on Si wafers, glassy C, and SiO2 substrates by CVD using ethylene as the C source. The films were treated with NaOH, HNO3, and HF to make their surface more hydrophilic and with parylene, polydimethylsiloxane, and VTMOS to make their surface more hydrophobic. The samples were characterized by SEM, TEM, and Raman spectroscopy. The wetting behavior of the surface-modified films was studied by contact angle measurements under the following liqs.: H2O, EtOH, 1,2-ethanediol, THF, glycerol, ethylene glycol, cyclohexane, hexadecane, polydimethylsiloxane, and poly(3,3,3-trifluoropropylsiloxane). Furthermore, the wetting behavior was investigated for as deposited films which were annealed between 900-2000 Deg under vacuum.
Original languageEnglish
Pages (from-to)3-4
Number of pages2
JournalPreprints of Symposia - American Chemical Society, Division of Fuel Chemistry
Volume51
Issue number1
Publication statusPublished - 2006

Fingerprint

Wetting
Carbon
Ethylene Glycol
Angle measurement
Glycerol
Contact angle
Raman spectroscopy
Chemical vapor deposition
Vacuum
Transmission electron microscopy
Thin films
Scanning electron microscopy
Substrates
baysilon
parylene
ethylene
n-hexadecane
Cyclohexane

Keywords

  • Annealing
  • surface functionalization to control wetting behavior of nanostructured carbons)
  • Hydrophilicity
  • Wetting (surface functionalization to control wetting behavior of nanostructured carbons)
  • Surface treatment
  • Contact angle
  • Hydrophobicity
  • carbon film surface functionalization wetting hydrophobicity hydrophilicity
  • Nanostructures
  • Vapor deposition process (chem.

Cite this

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title = "Surface functionalization to control the wetting behavior of nanostructured carbons",
abstract = "Thin films of C were deposited on Si wafers, glassy C, and SiO2 substrates by CVD using ethylene as the C source. The films were treated with NaOH, HNO3, and HF to make their surface more hydrophilic and with parylene, polydimethylsiloxane, and VTMOS to make their surface more hydrophobic. The samples were characterized by SEM, TEM, and Raman spectroscopy. The wetting behavior of the surface-modified films was studied by contact angle measurements under the following liqs.: H2O, EtOH, 1,2-ethanediol, THF, glycerol, ethylene glycol, cyclohexane, hexadecane, polydimethylsiloxane, and poly(3,3,3-trifluoropropylsiloxane). Furthermore, the wetting behavior was investigated for as deposited films which were annealed between 900-2000 Deg under vacuum.",
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author = "Davide Mattia and Yury Gogotsi",
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journal = "Preprints of Symposia - American Chemical Society, Division of Fuel Chemistry",
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T1 - Surface functionalization to control the wetting behavior of nanostructured carbons

AU - Mattia, Davide

AU - Gogotsi, Yury

PY - 2006

Y1 - 2006

N2 - Thin films of C were deposited on Si wafers, glassy C, and SiO2 substrates by CVD using ethylene as the C source. The films were treated with NaOH, HNO3, and HF to make their surface more hydrophilic and with parylene, polydimethylsiloxane, and VTMOS to make their surface more hydrophobic. The samples were characterized by SEM, TEM, and Raman spectroscopy. The wetting behavior of the surface-modified films was studied by contact angle measurements under the following liqs.: H2O, EtOH, 1,2-ethanediol, THF, glycerol, ethylene glycol, cyclohexane, hexadecane, polydimethylsiloxane, and poly(3,3,3-trifluoropropylsiloxane). Furthermore, the wetting behavior was investigated for as deposited films which were annealed between 900-2000 Deg under vacuum.

AB - Thin films of C were deposited on Si wafers, glassy C, and SiO2 substrates by CVD using ethylene as the C source. The films were treated with NaOH, HNO3, and HF to make their surface more hydrophilic and with parylene, polydimethylsiloxane, and VTMOS to make their surface more hydrophobic. The samples were characterized by SEM, TEM, and Raman spectroscopy. The wetting behavior of the surface-modified films was studied by contact angle measurements under the following liqs.: H2O, EtOH, 1,2-ethanediol, THF, glycerol, ethylene glycol, cyclohexane, hexadecane, polydimethylsiloxane, and poly(3,3,3-trifluoropropylsiloxane). Furthermore, the wetting behavior was investigated for as deposited films which were annealed between 900-2000 Deg under vacuum.

KW - Annealing

KW - surface functionalization to control wetting behavior of nanostructured carbons)

KW - Hydrophilicity

KW - Wetting (surface functionalization to control wetting behavior of nanostructured carbons)

KW - Surface treatment

KW - Contact angle

KW - Hydrophobicity

KW - carbon film surface functionalization wetting hydrophobicity hydrophilicity

KW - Nanostructures

KW - Vapor deposition process (chem.

M3 - Article

VL - 51

SP - 3

EP - 4

JO - Preprints of Symposia - American Chemical Society, Division of Fuel Chemistry

JF - Preprints of Symposia - American Chemical Society, Division of Fuel Chemistry

SN - 1521-4648

IS - 1

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