Stability of soliplasmon excitations at metal/dielectric interfaces

A Ferrando; C Milian; D Ceballos; Dmitry V Skryabin

doi:10.1109/NLP.2011.6102645

Stability of soliplasmon excitations at metal/dielectric interfaces

A Ferrando, C Milian, D Ceballos, Dmitry V Skryabin

Department of Physics

Research output: Chapter or section in a book/report/conference proceeding › Chapter or section

Abstract

We show the stability features of different families of soliplasmon excitations by analyzing their different propagation patterns under random perturbations of the initial profile. The role of phase and dispersive waves is also unveiled.

Original language	English
Title of host publication	Nonlinear Photonics (NLP), 2011 International Workshop
Place of Publication	Piscataway, NJ
Publisher	IEEE
DOIs	https://doi.org/10.1109/NLP.2011.6102645
Publication status	Published - 2011

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10.1109/NLP.2011.6102645

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title = "Stability of soliplasmon excitations at metal/dielectric interfaces",

abstract = "We show the stability features of different families of soliplasmon excitations by analyzing their different propagation patterns under random perturbations of the initial profile. The role of phase and dispersive waves is also unveiled.",

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AU - Ferrando, A

AU - Milian, C

AU - Ceballos, D

AU - Skryabin, Dmitry V

PY - 2011

Y1 - 2011

N2 - We show the stability features of different families of soliplasmon excitations by analyzing their different propagation patterns under random perturbations of the initial profile. The role of phase and dispersive waves is also unveiled.

AB - We show the stability features of different families of soliplasmon excitations by analyzing their different propagation patterns under random perturbations of the initial profile. The role of phase and dispersive waves is also unveiled.

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U2 - 10.1109/NLP.2011.6102645

DO - 10.1109/NLP.2011.6102645

M3 - Chapter or section

BT - Nonlinear Photonics (NLP), 2011 International Workshop

PB - IEEE

CY - Piscataway, NJ

ER -

Stability of soliplasmon excitations at metal/dielectric interfaces

Abstract

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