Slow ramp - voltage technique for investigation of breakdown voltage distribution in thin plasma nitrided SiO2 films

G. Slavcheva

Research output: Contribution to journalArticle

120 Downloads (Pure)
Original languageEnglish
Pages (from-to)41-57
JournalThin Solid Films
Volume192
Issue number1
DOIs
Publication statusPublished - 1 Nov 1990

Cite this