TY - JOUR
T1 - Single-source AACVD of composite cobalt-silicon oxide thin films
AU - Hill, M.S.
AU - Johnson, A.L.
AU - Manning, T.D.
AU - Molloy, K.C.
AU - Wickham, B.J.
PY - 2014/10/1
Y1 - 2014/10/1
N2 - A series of cobalt(II) complexes comprising either triorganosiloxide or tris(tert-butoxy)siloxide ligands have been synthesized and characterized. A mononuclear constitution is enforced through the incorporation of bi- and tridentate N-donor ligands. The resultant 4- or 6-coordinate complexes have been identified by single-crystal X-ray diffraction analysis and have been assessed for their potential as molecular precursors to hybrid cobalt/silicon oxide thin film materials by thermogravimetric analysis. A TMEDA adduct of the bis-ligated Co(II) tris(tert-butoxy)siloxide species has been utilized as a single-source precursor for the AACVD of aesthetically attractive blue composite films. Analysis by PXRD, SEM, EDS and XPS indicated the production of amorphous, continuous films with the bulk compositions reflecting the cobalt, silicon and oxygen stoichiometry of the molecular precursor complex.
AB - A series of cobalt(II) complexes comprising either triorganosiloxide or tris(tert-butoxy)siloxide ligands have been synthesized and characterized. A mononuclear constitution is enforced through the incorporation of bi- and tridentate N-donor ligands. The resultant 4- or 6-coordinate complexes have been identified by single-crystal X-ray diffraction analysis and have been assessed for their potential as molecular precursors to hybrid cobalt/silicon oxide thin film materials by thermogravimetric analysis. A TMEDA adduct of the bis-ligated Co(II) tris(tert-butoxy)siloxide species has been utilized as a single-source precursor for the AACVD of aesthetically attractive blue composite films. Analysis by PXRD, SEM, EDS and XPS indicated the production of amorphous, continuous films with the bulk compositions reflecting the cobalt, silicon and oxygen stoichiometry of the molecular precursor complex.
KW - AACVD
KW - Aerosol-assisted chemical vapour
KW - Cobalt
KW - deposition
KW - Siloxide
KW - Single-source
UR - http://www.scopus.com/inward/record.url?scp=84908208754&partnerID=8YFLogxK
UR - http://dx.doi.org/10.1016/j.ica.2014.07.045
U2 - 10.1016/j.ica.2014.07.045
DO - 10.1016/j.ica.2014.07.045
M3 - Article
AN - SCOPUS:84908208754
SN - 0020-1693
VL - 422
SP - 47
EP - 56
JO - Inorganica Chimica Acta
JF - Inorganica Chimica Acta
ER -