Single-source AACVD of composite cobalt-silicon oxide thin films

M.S. Hill, A.L. Johnson, T.D. Manning, K.C. Molloy, B.J. Wickham

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A series of cobalt(II) complexes comprising either triorganosiloxide or tris(tert-butoxy)siloxide ligands have been synthesized and characterized. A mononuclear constitution is enforced through the incorporation of bi- and tridentate N-donor ligands. The resultant 4- or 6-coordinate complexes have been identified by single-crystal X-ray diffraction analysis and have been assessed for their potential as molecular precursors to hybrid cobalt/silicon oxide thin film materials by thermogravimetric analysis. A TMEDA adduct of the bis-ligated Co(II) tris(tert-butoxy)siloxide species has been utilized as a single-source precursor for the AACVD of aesthetically attractive blue composite films. Analysis by PXRD, SEM, EDS and XPS indicated the production of amorphous, continuous films with the bulk compositions reflecting the cobalt, silicon and oxygen stoichiometry of the molecular precursor complex.
Original languageEnglish
Pages (from-to)47-56
Number of pages10
JournalInorganica Chimica Acta
Early online date27 Jul 2014
Publication statusPublished - 1 Oct 2014


  • Aerosol-assisted chemical vapour
  • Cobalt
  • deposition
  • Siloxide
  • Single-source


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