Original language | English |
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Pages (from-to) | 947-949 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 80 |
Issue number | 6 |
Publication status | Published - 2002 |
Simple expression for vacancy concentrations at half ion range following MeV ion implantation of silicon
P G Coleman, C P Burrows, A P Knights
Research output: Contribution to journal › Article › peer-review
32
Citations
(SciVal)