Silicon based optical devices - photonic applications of anisotropically nanostructured silicon

J Diener, N Kunzner, E Gross, D Kovalev, M Fujii

Research output: Contribution to journalArticle

9 Citations (Scopus)

Abstract

Anisotropic nanostructuring of bulk silicon (Si) wafers leads to a significant in-plane optical anisotropy of single porous silicon (PSi) layers. Additionally a variation of the etching current in time allows a controlled modification of the porosity along the growth direction and therefore a three-dimensional variation of the refractive index (in-plane and in-depth). This technique can be important for photonic applications since it is the basis of a development of a variety of novel, polarization-sensitive, silicon-based optical devices: retarders, dichroic Bragg reflectors, dichroic microcavities and planar Si-based polarizers. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Original languageEnglish
Pages (from-to)1432-1436
Number of pages5
JournalPhysica Status Solidi A: Applications and Materials Science
Volume202
Issue number8
DOIs
Publication statusPublished - 2005

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