Selectivity and Growth Rate Modulations for Ruthenium Area-selective Deposition by Co-Reagent and Nanopattern Design

Akhilesh Kumar Mandal, Marleen H. van der Veen, Negin Rahnemai Haghighi, Max Robson, Niels Claessens, Johan Meersschaut, Nicolas Jourdan, Zsolt Tokei, Annelies Delabie

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Material Science

Chemical Engineering