Resolving the High-k Paradox in Organic Field-Effect Transistors Through Rational Dielectric Design

Beomjin Jeong, Kamal Asadi

Research output: Contribution to journalArticlepeer-review

Abstract

Dielectric materials with high relative permittivity, i.e., high-k dielectrics, are in great demand for application as gate dielectric for the development of field-effect transistors operating at low voltages. However, a high-k gate dielectric does not always produce favorable outcomes, particularly in field-effect transistors based on organic semiconductors (OFETs). Contradicting experimental results have been reported, with some studies showing compromised OFET performance, while others demonstrate enhanced performance when using high-k gate dielectrics. Currently, no comprehensive or systematic study has been conducted to compare or integrate these conflicting results. As a result, the relative validity and broader implications of these conflicting findings remain uncertain. Here, the effects of high-k gate dielectrics with systematically varied dielectric constants on OFET performance are systematically investigated and the inconsistencies in the literature are resolved. By employing a highly miscible high-k polymer blend system, it is demonstrated that both positive and negative correlations of dielectric constant and field-effect mobility exist in different semiconductor systems. These results provide a strategy to rationally design organic transistors that incorporate high-k dielectrics, without compromising the field-effect mobility due to the broadening of the density of states.
Original languageEnglish
Article number2500040
JournalAdvanced Electronic Materials
Early online date21 Mar 2025
DOIs
Publication statusE-pub ahead of print - 21 Mar 2025

Data Availability Statement

The data that support the findings of this study are available from the corresponding author upon reasonable request.

Funding

This work was supported by the Basic Research Laboratory project granted from the National Research Foundation (NRF) funded by the Ministry of Science and ICT (No. RS-2023-00221396)

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