Resistance Ridges Along Filling Factor ν = 4i in SiO2/Si/SiO2 Quantum Wells

Kei Takashina; Marc Aurele Brun; Takeshi Ota; Duncan Maude; Akira Fujiwara; Yukinori Ono; Hiroshi Inokawa; Yoshiro Hirayama

doi:10.1063/1.2730046

Resistance Ridges Along Filling Factor ν = 4i in SiO2/Si/SiO2 Quantum Wells

Kei Takashina
, Marc Aurele Brun
, Takeshi Ota
, Duncan Maude
, Akira Fujiwara
, Yukinori Ono
, Hiroshi Inokawa
, Yoshiro Hirayama

Department of Physics

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	625
Journal	AIP Conference Proceedings
Volume	893
DOIs	https://doi.org/10.1063/1.2730046
Publication status	Published - 10 Apr 2007

Access to Document

10.1063/1.2730046

Cite this

@article{0c65dfe8bea844ca896dad47f955036e,

title = "Resistance Ridges Along Filling Factor ν = 4i in SiO2/Si/SiO2 Quantum Wells",

author = "Kei Takashina and Brun, \{Marc Aurele\} and Takeshi Ota and Duncan Maude and Akira Fujiwara and Yukinori Ono and Hiroshi Inokawa and Yoshiro Hirayama",

year = "2007",

month = apr,

day = "10",

doi = "10.1063/1.2730046",

language = "English",

volume = "893",

pages = "625",

journal = "AIP Conference Proceedings",

issn = "0094-243X",

publisher = "American Institute of Physics",

}

TY - JOUR

T1 - Resistance Ridges Along Filling Factor ν = 4i in SiO2/Si/SiO2 Quantum Wells

AU - Takashina, Kei

AU - Brun, Marc Aurele

AU - Ota, Takeshi

AU - Maude, Duncan

AU - Fujiwara, Akira

AU - Ono, Yukinori

AU - Inokawa, Hiroshi

AU - Hirayama, Yoshiro

PY - 2007/4/10

Y1 - 2007/4/10

UR - http://dx.doi.org/10.1063/1.2730046

U2 - 10.1063/1.2730046

DO - 10.1063/1.2730046

M3 - Article

SN - 0094-243X

VL - 893

SP - 625

JO - AIP Conference Proceedings

JF - AIP Conference Proceedings

ER -

Resistance Ridges Along Filling Factor ν = 4i in SiO2/Si/SiO2 Quantum Wells

Access to Document

Other files and links

Cite this