Recent developments in molecular precursors for atomic layer deposition

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Citation (Scopus)

Abstract

One field of organometallic and materials chemistry that has seen great advancements over the last 20 years is that of atomic layer deposition (ALD), and in particular the development of precursors for the deposition of thin films of highly functional materials. This review focuses on newly developed ALD precursors for metals and metalloid elements (Groups I to XV). New precursors are necessary for a wide range of both established and emerging high-tech applications. A brief overview of recent advances in precursor chemistry is given.

Original languageEnglish
Title of host publicationOrganometallic Chemistry
EditorsNathan J. Patmore, Paul Elliott
PublisherRoyal Society of Chemistry
Pages1-53
Number of pages53
Volume42
ISBN (Electronic)9781788010054
DOIs
Publication statusPublished - 23 Nov 2018

Publication series

NameOrganometallic Chemistry
Volume42
ISSN (Print)0301-0074

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Inorganic Chemistry

Cite this

Johnson, A. L., & Parish, J. D. (2018). Recent developments in molecular precursors for atomic layer deposition. In N. J. Patmore, & P. Elliott (Eds.), Organometallic Chemistry (Vol. 42, pp. 1-53). (Organometallic Chemistry; Vol. 42). Royal Society of Chemistry. https://doi.org/10.1039/9781788010672-00001