Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal-Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions

Andrew Johnson, Stephen Richards, Troy D. Manning, Michael Hill, Kieran Molloy

Research output: Contribution to journalArticlepeer-review

5 Citations (SciVal)
70 Downloads (Pure)
Filter
Finished

Search results