A series of unsymmetrical nickel beta-diketonate derivatives have been synthesised and structurally characterised for application as atmospheric-pressure metal-organic chemical vapour deposition (AP-MOCVD) precursors for nickel oxide.TMEDA)Ni[MeC(O) CHC(O) OEt](2) (TMEDA = tetramethylethylenediamine) was selected and used to deposit NiO films of varying thickness onto commercial indium tin oxide (ITO)-coated glass; the work function of the ITO was raised as a consequence.
- Chemical vapor deposition
- Thin films
- Nickel; Precursors
Johnson, A., Richards, S., Manning, T. D., Hill, M., & Molloy, K. (2017). Precursors for p-Type Nickel Oxide: Atmospheric-Pressure Metal-Organic Chemical-Vapour Deposition (MOCVD) of Nickel Oxide Thin Films with High Work Functions. European Journal of Inorganic Chemistry, 2017(13), 1868-1876. https://doi.org/10.1002/ejic.201601419