Post-fabrication selective magnetic annealing technique in standard MEMS processes

A. Mohammadi, N. C. Karmakar, M. R. Yuce

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Post-fab selective magnetic annealing
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. The following article appeared in Mohammadi, A, Karmakar, NC & Yuce, MR 2016, 'Post-fabrication selective magnetic annealing technique in standard MEMS processes', Applied Physics Letters, vol. 109, no. 22, 221906. and may be found at https://doi.org/10.1063/1.4971262.
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@article{9b7d5cd381414e70aa53a80ce80d1a62,

title = "Post-fabrication selective magnetic annealing technique in standard MEMS processes",

author = "A. Mohammadi and Karmakar, {N. C.} and Yuce, {M. R.}",

year = "2016",

month = nov,

day = "28",

doi = "10.1063/1.4971262",

language = "English",

volume = "109",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "22",

}