Plasma enhanced chemical vapour deposition of horizontally aligned carbon nanotubes

Matthew T. Cole, William I. Milne

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child's law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm-1 with linear packing densities of up to ̃5 × 104 cm-1. These results open up the potential for multi-directional in situ alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.

Original languageEnglish
Pages (from-to)2262-2273
Number of pages12
JournalMaterials
Volume6
Issue number6
DOIs
Publication statusPublished - 31 May 2013

Keywords

  • Carbon nanotube
  • Electric field
  • In situ horizontal alignment
  • Plasma enhanced chemical vapor deposition

ASJC Scopus subject areas

  • Materials Science(all)

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