Plasma-Enhanced Atomic Layer Deposition of Hematite for Photoelectrochemical Water Splitting Applications

Engineering

• Water Splitting 100%
• Atomic Layer Deposition 100%
• Metrics 33%
• Thin Films 33%
• Reactant 33%
• Diffusion Length 33%
• Deposition Process 33%
• Nanorod 33%
• Reactor Temperature 33%
• Thin Film Growth 33%
• Cycle Count 33%
• Band Gap 33%
• Rate Constant 33%

Material Science

• Hematite 100%
• Photoelectrochemical Water Splitting 100%
• Titanium Oxide 33%
• Film 33%
• Thin Films 33%
• Nanorod 33%
• Film Deposition 33%
• Thin Film Growth 33%
• Ultrathin Film 33%

Chemical Engineering

• Atomic Layer Deposition 100%
• Film 100%
• Titanium Oxide 25%
• Nanorod 25%