Noncritical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

C. W. Tee; K. A. Williams; R. V. Penty; I. H. White; M. Hamacher

doi:10.1109/LPT.2006.883199

Noncritical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

C. W. Tee, K. A. Williams, R. V. Penty, I. H. White, M. Hamacher

Vice Chancellor's Office

Research output: Contribution to journal › Article › peer-review

2 Citations (SciVal)

Abstract

Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient - only 6% for fabrication misalignments as high as 1 μm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.

Original language	English
Pages (from-to)	2129-2131
Number of pages	3
Journal	IEEE Photonics Technology Letters
Volume	18
Issue number	20
DOIs	https://doi.org/10.1109/LPT.2006.883199
Publication status	Published - 23 Oct 2006

Funding

Manuscript received March 30, 2006; revised July 19, 2006. This work was supported in part by the European Community through the research project Wafer-bonding and Active Passive Integration Technology and Implementation [(WAPITI) FP6-2003-IST-2-004073].

Keywords

Active-passive integration
Coupling coefficient
Microring resonator
Mode-expanded bus waveguide
Vertical coupling
Wafer bonding
Waveguide coupling
Waveguide misalignment

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Atomic and Molecular Physics, and Optics
Electrical and Electronic Engineering

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10.1109/LPT.2006.883199

Cite this

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abstract = "Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient - only 6% for fabrication misalignments as high as 1 μm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.",

keywords = "Active-passive integration, Coupling coefficient, Microring resonator, Mode-expanded bus waveguide, Vertical coupling, Wafer bonding, Waveguide coupling, Waveguide misalignment",

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year = "2006",

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AU - Williams, K. A.

AU - Penty, R. V.

AU - White, I. H.

AU - Hamacher, M.

PY - 2006/10/23

Y1 - 2006/10/23

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AB - Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient - only 6% for fabrication misalignments as high as 1 μm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.

KW - Active-passive integration

KW - Coupling coefficient

KW - Microring resonator

KW - Mode-expanded bus waveguide

KW - Vertical coupling

KW - Wafer bonding

KW - Waveguide coupling

KW - Waveguide misalignment

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ER -

Noncritical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

Abstract

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Keywords

ASJC Scopus subject areas

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