Noncritical waveguide alignment for vertically coupled microring using a mode-expanded bus architecture

C. W. Tee, K. A. Williams, R. V. Penty, I. H. White, M. Hamacher

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient - only 6% for fabrication misalignments as high as 1 μm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.

Original languageEnglish
Pages (from-to)2129-2131
Number of pages3
JournalIEEE Photonics Technology Letters
Volume18
Issue number20
DOIs
Publication statusPublished - 23 Oct 2006

Keywords

  • Active-passive integration
  • Coupling coefficient
  • Microring resonator
  • Mode-expanded bus waveguide
  • Vertical coupling
  • Wafer bonding
  • Waveguide coupling
  • Waveguide misalignment

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Electrical and Electronic Engineering

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