Abstract
Vertically coupled microrings in an all-pass filter configuration are fabricated with a range of waveguide misalignments deliberately introduced into the lithography masks to demonstrate noncritical fabrication requirements. The microrings have a mode-expanded bus design which allows a greatly reduced variation in power coupling coefficient - only 6% for fabrication misalignments as high as 1 μm. This represents a five-fold improvement in fabrication tolerance when compared with conventional designs.
Original language | English |
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Pages (from-to) | 2129-2131 |
Number of pages | 3 |
Journal | IEEE Photonics Technology Letters |
Volume | 18 |
Issue number | 20 |
DOIs | |
Publication status | Published - 23 Oct 2006 |
Keywords
- Active-passive integration
- Coupling coefficient
- Microring resonator
- Mode-expanded bus waveguide
- Vertical coupling
- Wafer bonding
- Waveguide coupling
- Waveguide misalignment
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Electrical and Electronic Engineering