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Abstract
This paper presents the results using an alternative defects and strain minimizing technique with nanostructures as the compliant layer to grow III-V nitrides onto foreign substrates. Defects reduction amd stress relaxation had been observed through HRTEM on GaN grown on sapphire and silicon. Results of LED devices on silicon with performance compatible with those on sapphire are presented.
Original language | English |
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Pages (from-to) | 187-190 |
Number of pages | 4 |
Journal | Journal of Light and Visual Environment |
Volume | 32 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2008 |
Keywords
- Sapphire
- Light emitting diodes
- Corundum
- Light sources
- Gallium alloys
- Light emission
- Nitrides
- Nonmetals
- Semiconducting gallium
- Semiconducting silicon compounds
- Gallium nitride
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Dive into the research topics of 'Nano-pendeo GaN growth of light emitting devices on silicon'. Together they form a unique fingerprint.Projects
- 1 Finished
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GROWTH OF THICK AND FLAT HIGH QUALITY GAN USING NANO-COLUMN COMPLIANT LAYERS
Wang, W. (PI) & Lapkin, A. (CoI)
Engineering and Physical Sciences Research Council
1/09/06 → 31/10/08
Project: Research council