Molecular scale alignment strategies: An investigation of Ag adsorption on patterned fullerene layers

AW Dunn; BN Cotier; Alain Nogaret; P. Moriarty; PH Beton; sp beaumont

doi:10.1063/1.120221

Molecular scale alignment strategies: An investigation of Ag adsorption on patterned fullerene layers

AW Dunn, BN Cotier, Alain Nogaret, P. Moriarty, PH Beton, sp beaumont

Department of Physics

University of Birmingham

Research output: Contribution to journal › Article › peer-review

13 Citations (SciVal)

Abstract

We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7.

Original language	English
Pages (from-to)	2937-2939
Number of pages	3
Journal	Applied Physics Letters
Volume	71
Issue number	20
DOIs	https://doi.org/10.1063/1.120221
Publication status	Published - 17 Nov 1997

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title = "Molecular scale alignment strategies: An investigation of Ag adsorption on patterned fullerene layers",

abstract = "We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7. ",

author = "AW Dunn and BN Cotier and Alain Nogaret and P. Moriarty and PH Beton and sp beaumont",

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AU - Dunn, AW

AU - Cotier, BN

AU - Nogaret, Alain

AU - Moriarty, P.

AU - Beton, PH

AU - beaumont, sp

PY - 1997/11/17

Y1 - 1997/11/17

N2 - We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7.

AB - We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7.

UR - https://www.scopus.com/pages/publications/0001753826

U2 - 10.1063/1.120221

DO - 10.1063/1.120221

M3 - Article

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VL - 71

SP - 2937

EP - 2939

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 20

ER -

Molecular scale alignment strategies: An investigation of Ag adsorption on patterned fullerene layers

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