Molecular scale alignment strategies: An investigation of Ag adsorption on patterned fullerene layers

AW Dunn, BN Cotier, Alain Nogaret, P. Moriarty, PH Beton, sp beaumont

Research output: Contribution to journalArticlepeer-review

13 Citations (Scopus)

Abstract

We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7.
Original languageEnglish
Pages (from-to)2937-2939
Number of pages3
JournalApplied Physics Letters
Volume71
Issue number20
DOIs
Publication statusPublished - 17 Nov 1997

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