Abstract
We have developed a procedure for atomic scale alignment with respect to macroscopic objects. Metallic and etched registration marks on clean reconstructed Si surfaces are used to guide the tip of a scanning tunnellingmicroscope. The metallic marks are formed from Ta and can withstand thermal cycling up to 1500 K. These procedures have been used to investigate the interaction of Ag with a patterned fullerenemultilayer deposited on Si(111)-7×7.
Original language | English |
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Pages (from-to) | 2937-2939 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 71 |
Issue number | 20 |
DOIs | |
Publication status | Published - 17 Nov 1997 |