Molecular and atomic manipulation mediated by electronic excitation of the underlying Si(111)-7x7 surface

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Abstract

We report the local atomic manipulation properties of chemisorbed toluene molecules on the Si(111)-7x7 surface and of the silicon adatoms of the surface. Charge injected directly into the molecule, or into its underlying bonding silicon adatom, can induce the molecule to change bonding site. The voltage dependence of the rates of these processes match closely with scanning tunnelling spectroscopy of the toluene and adatom species. The branching ratio between toluene molecules which are moved to a neighbouring site, or those that travel further is invariant to voltage, suggesting a common final manipulation step for both injection into the molecule and into the bonding adatom site. At low temperatures the rate of silicon adatom manipulation matches that of toluene manipulation, further suggesting that all these manipulation processes are driven by electronic excitation of the underlying silicon surface. Our results therefore suggest that a common non-adiabatic process mediates atomic and molecular manipulation induced by the STM on the Si(111)-7x7 surface and may also mediate similar manipulation induced by the laser irradiation of the Si(111)-7x7 surface.
Original languageEnglish
Article number054002
Number of pages10
JournalNanotechnology
Volume28
Issue number5
DOIs
Publication statusPublished - 23 Dec 2016

Fingerprint

Adatoms
Toluene
manipulators
Silicon
adatoms
Molecules
toluene
electronics
excitation
molecules
silicon
Electric potential
Laser beam effects
electric potential
Spectroscopy
Scanning
travel
heat transfer
injection
irradiation

Keywords

  • Surfaces
  • STM
  • manipulation
  • Desorption

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

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title = "Molecular and atomic manipulation mediated by electronic excitation of the underlying Si(111)-7x7 surface",
abstract = "We report the local atomic manipulation properties of chemisorbed toluene molecules on the Si(111)-7x7 surface and of the silicon adatoms of the surface. Charge injected directly into the molecule, or into its underlying bonding silicon adatom, can induce the molecule to change bonding site. The voltage dependence of the rates of these processes match closely with scanning tunnelling spectroscopy of the toluene and adatom species. The branching ratio between toluene molecules which are moved to a neighbouring site, or those that travel further is invariant to voltage, suggesting a common final manipulation step for both injection into the molecule and into the bonding adatom site. At low temperatures the rate of silicon adatom manipulation matches that of toluene manipulation, further suggesting that all these manipulation processes are driven by electronic excitation of the underlying silicon surface. Our results therefore suggest that a common non-adiabatic process mediates atomic and molecular manipulation induced by the STM on the Si(111)-7x7 surface and may also mediate similar manipulation induced by the laser irradiation of the Si(111)-7x7 surface.",
keywords = "Surfaces, STM, manipulation, Desorption",
author = "Kristina Rusimova and Peter Sloan",
note = "Data supporting this publication are available from https://doi.org/10.15125/BATH-00315",
year = "2016",
month = "12",
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doi = "10.1088/1361-6528/28/5/054002",
language = "English",
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T1 - Molecular and atomic manipulation mediated by electronic excitation of the underlying Si(111)-7x7 surface

AU - Rusimova, Kristina

AU - Sloan, Peter

N1 - Data supporting this publication are available from https://doi.org/10.15125/BATH-00315

PY - 2016/12/23

Y1 - 2016/12/23

N2 - We report the local atomic manipulation properties of chemisorbed toluene molecules on the Si(111)-7x7 surface and of the silicon adatoms of the surface. Charge injected directly into the molecule, or into its underlying bonding silicon adatom, can induce the molecule to change bonding site. The voltage dependence of the rates of these processes match closely with scanning tunnelling spectroscopy of the toluene and adatom species. The branching ratio between toluene molecules which are moved to a neighbouring site, or those that travel further is invariant to voltage, suggesting a common final manipulation step for both injection into the molecule and into the bonding adatom site. At low temperatures the rate of silicon adatom manipulation matches that of toluene manipulation, further suggesting that all these manipulation processes are driven by electronic excitation of the underlying silicon surface. Our results therefore suggest that a common non-adiabatic process mediates atomic and molecular manipulation induced by the STM on the Si(111)-7x7 surface and may also mediate similar manipulation induced by the laser irradiation of the Si(111)-7x7 surface.

AB - We report the local atomic manipulation properties of chemisorbed toluene molecules on the Si(111)-7x7 surface and of the silicon adatoms of the surface. Charge injected directly into the molecule, or into its underlying bonding silicon adatom, can induce the molecule to change bonding site. The voltage dependence of the rates of these processes match closely with scanning tunnelling spectroscopy of the toluene and adatom species. The branching ratio between toluene molecules which are moved to a neighbouring site, or those that travel further is invariant to voltage, suggesting a common final manipulation step for both injection into the molecule and into the bonding adatom site. At low temperatures the rate of silicon adatom manipulation matches that of toluene manipulation, further suggesting that all these manipulation processes are driven by electronic excitation of the underlying silicon surface. Our results therefore suggest that a common non-adiabatic process mediates atomic and molecular manipulation induced by the STM on the Si(111)-7x7 surface and may also mediate similar manipulation induced by the laser irradiation of the Si(111)-7x7 surface.

KW - Surfaces

KW - STM

KW - manipulation

KW - Desorption

UR - http://dx.doi.org/10.1088/1361-6528/28/5/054002

UR - https://doi.org/10.15125/BATH-00315

U2 - 10.1088/1361-6528/28/5/054002

DO - 10.1088/1361-6528/28/5/054002

M3 - Article

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JO - Nanotechnology

JF - Nanotechnology

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