Abstract
Photoluminescence experiments have identified strain as the origin for polarization pinning in vertical cavity surface emitting lasers post-processed by focused ion beam etching. Theoretical models were applied to deduce the strain in devices. Post-annealing was used to optimize polarization pinning.
| Original language | English |
|---|---|
| Pages (from-to) | 119-120 |
| Number of pages | 2 |
| Journal | Conference Digest - IEEE International Semiconductor Laser Conference |
| Publication status | Published - 1 Dec 1998 |
| Event | Proceedings of the 1998 16th IEEE International Semiconductor Laser Conference, ISLC - Nara, Jpn Duration: 4 Oct 1998 → 8 Oct 1998 |
ASJC Scopus subject areas
- Electrical and Electronic Engineering
- Condensed Matter Physics