Making a mark

Research output: Contribution to journalArticle

Abstract

A team of researchers from the University of Bath, UK, is developing a new nano-imprint process, which can improve the established techniques, such as lithography, ablation, and etching. The novel large-area nano-imprint process overcomes the limitations of other methods and lends itself to large-scale low-cost imprinting. New structures can be built at low efforts due to its potential application to pattern replication in hard substrates, including silicon, gallium nitride and ferroelectrics such as lithium niobate. The substrate that is to be nano-structured is initially spin-coated with a thin film of UV-sensitive imprint resist. This is followed by a short, low-temperature pre-bake to evaporate excess solvent and promote adhesion of the polymer film to the substrate. A polyethylene terephthalate (PET) master structure is applied to imprint a positive nano-dot structure surface into the softer UV-cured polymer resist.
LanguageEnglish
Pages20-21
Number of pages2
JournalMaterials World
Volume20
Issue number2
StatusPublished - Feb 2012

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Substrates
Gallium nitride
Polyethylene Terephthalates
Silicon
Ablation
Polymer films
Surface structure
Polyethylene terephthalates
Lithography
Ferroelectric materials
Etching
Polymers
Lithium
Adhesion
Thin films
Costs
Temperature
gallium nitride
lithium niobate

Cite this

Making a mark. / Bowen, Christopher.

In: Materials World, Vol. 20, No. 2, 02.2012, p. 20-21.

Research output: Contribution to journalArticle

Bowen, C 2012, 'Making a mark' Materials World, vol. 20, no. 2, pp. 20-21.
Bowen C. Making a mark. Materials World. 2012 Feb;20(2):20-21.
Bowen, Christopher. / Making a mark. In: Materials World. 2012 ; Vol. 20, No. 2. pp. 20-21
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