Abstract
We present magnetic and magnetoelastic data measured from a wide range of amorphous films grown by R.F. sputter deposition. The films were deposited in HV conditions at sputtering pressures of 5 to 80 mTorr and power densities of 1.6 and 3.2 W/cm2. Compositions were measured by electron probe micro-analysis (EPMA) and found to be similar to the target material at pressures of 20 mTorr. This pressure also gave the minimum coercivity and minimum stress corresponding to a transition from compressive to tensile stress. All films exhibited in-plane anisotropy, the origin of which is the stray induction from the target magnetron magnets.
| Original language | English |
|---|---|
| Pages (from-to) | 4806-4808 |
| Number of pages | 3 |
| Journal | IEEE Transactions on Magnetics |
| Volume | 30 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - Nov 1994 |
Bibliographical note
Funding Information:Manuscript received April 4h, 1994. A. D. Mattingley, e-mail A.D.MattingleyOShefi3eld.ac.uk phone +44 (0) 742 824271, C. Sheanvood e-mail [email protected],h one +44 (0)742 824279, M. R. J. Gibbs e-mail [email protected], phone+44 (0) 742 824261. British Technology Group and the Engineering and Physical Sciences Research Council are acknowledged for their support.
Funding
Manuscript received April 4h, 1994. A. D. Mattingley, e-mail A.D.MattingleyOShefi3eld.ac.uk phone +44 (0) 742 824271, C. Sheanvood e-mail [email protected],h one +44 (0)742 824279, M. R. J. Gibbs e-mail [email protected], phone+44 (0) 742 824261. British Technology Group and the Engineering and Physical Sciences Research Council are acknowledged for their support.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering