Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition

C S Blackman, C J Carmalt, T D Manning, I P Parkin, L Apostolico, K C Molloy

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

Thin films of crystalline chromium phosphide (CrP) have been produced from the dual-source atmospheric pressure CVD reaction of chromium hexacarbonyl and cyclohexylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented. (C) 2004 Elsevier B.V. All rights reserved.
Original languageEnglish
Pages (from-to)24-28
Number of pages5
JournalApplied Surface Science
Volume233
Issue number1-4
DOIs
Publication statusPublished - 2004

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Chromium
Atmospheric pressure
Energy dispersive spectroscopy
Chemical vapor deposition
X ray photoelectron spectroscopy
Crystalline materials
Thin films
Scanning electron microscopy
Temperature
chromium hexacarbonyl

Cite this

Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition. / Blackman, C S; Carmalt, C J; Manning, T D; Parkin, I P; Apostolico, L; Molloy, K C.

In: Applied Surface Science, Vol. 233, No. 1-4, 2004, p. 24-28.

Research output: Contribution to journalArticle

Blackman, C S ; Carmalt, C J ; Manning, T D ; Parkin, I P ; Apostolico, L ; Molloy, K C. / Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition. In: Applied Surface Science. 2004 ; Vol. 233, No. 1-4. pp. 24-28.
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