Large-area uniform graphene-like thin films grown by chemical vapor deposition directly on silicon nitride

Jie Sun, Niclas Lindvall, Matthew Cole, Kenneth B.K. Teo, August Yurgens

Research output: Contribution to journalArticle

80 Citations (Scopus)

Abstract

Large-area uniform carbon films with graphene-like properties are synthesized by chemical vapor deposition directly on Si3 N 4 /Si at 1000°C without metal catalysts. The as deposited films are atomically thin and wrinkle- and pinhole-free. The film thickness can be controlled by modifying the growth conditions. Raman spectroscopy confirms the s p2 graphitic structures. The films show ohmic behavior with a sheet resistance of ∼2.3-10.5 k/ at room temperature. An electric field effect of ∼2-10% (VG =-20 V) is observed. The growth is explained by the self-assembly of carbon clusters from hydrocarbon pyrolysis. The scalable and transfer-free technique favors the application of graphene as transparent electrodes.

Original languageEnglish
Article number252107
JournalApplied Physics Letters
Volume98
Issue number25
DOIs
Publication statusPublished - 20 Jun 2011

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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