Investigation of top gate electrode options for high-k gate dielectric MOS capacitors
- D. C. Moschou
- , E. Verrelli
- , D. N. Kouvatsos
- , P. Normand
- , D. Tsoukalas
- , A. Speliotis
- , P. Bayiati
- , D. Niarchos
- National Centre for Scientific Research “Demokritos”
- National Technical University of Athens
Research output: Contribution to journal › Article › peer-review