Abstract
We succeeded in integrating individual, pre-existing nanostructures into functional devices using ultrahigh vacuum dynamic nanostenciling. Nanostructures are first located via atomic force microscopy (AFM), while device elements are added step by step, with an achieved positional accuracy of 20 nm. Electronic transport, potentiometry, and scanning Kelvin probe can be used for control at any fabrication stage.
Original language | English |
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Title of host publication | 2nd IEEE International Nanoelectronics Conference, 2008. INEC 2008 |
Publisher | IEE |
Pages | 158 - 159 |
Number of pages | 2 |
ISBN (Print) | 9781424415724 |
DOIs | |
Publication status | Published - 2008 |
Event | 2nd IEEE International Nanoelectronics Conference, 2008 - Shanghai, China Duration: 24 Mar 2008 → 27 Mar 2008 |
Conference
Conference | 2nd IEEE International Nanoelectronics Conference, 2008 |
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Abbreviated title | INEC 2008 |
Country/Territory | China |
City | Shanghai |
Period | 24/03/08 → 27/03/08 |