Influence of cathode material and Si Cl4 gas on inductively coupled plasma etching of AlGaN layers with Cl2/Ar plasma

Evgeny Zhirnov, Sergei Stepanov, Wang Nang Wang, Y. G. Shreter, D. V. Takhin, N. I. Bochkareva

Research output: Contribution to journalArticlepeer-review

17 Citations (SciVal)

Fingerprint

Dive into the research topics of 'Influence of cathode material and Si Cl4 gas on inductively coupled plasma etching of AlGaN layers with Cl2/Ar plasma'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds