In situ Brewster angle microscopy and surface pressure studies on the interfacial growth of mesostructured silica thin films

Karen J. Edler, Steve J. Roser, Stephen Mann

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

Growth of a mesostructured silica thin film at the air/water interface was observed in situ using Brewster angle microscopy and surface pressure measurements allowing real time observation of nucleation of the film and its rapid growth to full surface coverage at the end of the induction period.

Original languageEnglish
Pages (from-to)773-774
Number of pages2
JournalChemical Communications
Issue number9
Early online date18 Apr 2000
DOIs
Publication statusPublished - 7 May 2000

Fingerprint

Silicon Dioxide
Microscopic examination
Silica
Thin films
Surface measurement
Pressure measurement
Nucleation
Water
Air

ASJC Scopus subject areas

  • Catalysis
  • Electronic, Optical and Magnetic Materials
  • Ceramics and Composites
  • Chemistry(all)
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

In situ Brewster angle microscopy and surface pressure studies on the interfacial growth of mesostructured silica thin films. / Edler, Karen J.; Roser, Steve J.; Mann, Stephen.

In: Chemical Communications, No. 9, 07.05.2000, p. 773-774.

Research output: Contribution to journalArticle

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