Skip to main navigation Skip to search Skip to main content

Impact of growth conditions on vacancy-type defects in silicon-germanium structures grown by molecular-beam epitaxy

Research output: Contribution to journalArticlepeer-review

9   Link opens in a new tab Citations (SciVal)
Original languageEnglish
JournalApplied Physics Letters
Volume86
Issue number13
DOIs
Publication statusPublished - 2005

Bibliographical note

ID number: ISI:000228422600041

Cite this