Abstract
A model of the graphene growth mechanism of chemical vapor deposition on platinum is proposed and verified by experiments. Surface catalysis and carbon segregation occur, respectively, at high and low temperatures in the process, representing the so-called balance and segregation regimes. Catalysis leads to self-limiting formation of large area monolayer graphene, whereas segregation results in multilayers, which evidently "grow from below." By controlling kinetic factors, dominantly monolayer graphene whose high quality has been confirmed by quantum Hall measurement can be deposited on platinum with hydrogen-rich environment, quench cooling, tiny but continuous methane flow and about 1000°C growth temperature.
| Original language | English |
|---|---|
| Article number | 152107 |
| Journal | Applied Physics Letters |
| Volume | 104 |
| Issue number | 15 |
| DOIs | |
| Publication status | Published - 18 Apr 2014 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)
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