TY - JOUR
T1 - Growth mechanism of graphene on platinum
T2 - Surface catalysis and carbon segregation
AU - Sun, Jie
AU - Nam, Youngwoo
AU - Lindvall, Niclas
AU - Cole, Matthew
AU - Kenneth, Kenneth B.
AU - Park, Yung Woo
AU - Yurgens, August
PY - 2014/4/18
Y1 - 2014/4/18
N2 - A model of the graphene growth mechanism of chemical vapor deposition on platinum is proposed and verified by experiments. Surface catalysis and carbon segregation occur, respectively, at high and low temperatures in the process, representing the so-called balance and segregation regimes. Catalysis leads to self-limiting formation of large area monolayer graphene, whereas segregation results in multilayers, which evidently "grow from below." By controlling kinetic factors, dominantly monolayer graphene whose high quality has been confirmed by quantum Hall measurement can be deposited on platinum with hydrogen-rich environment, quench cooling, tiny but continuous methane flow and about 1000°C growth temperature.
AB - A model of the graphene growth mechanism of chemical vapor deposition on platinum is proposed and verified by experiments. Surface catalysis and carbon segregation occur, respectively, at high and low temperatures in the process, representing the so-called balance and segregation regimes. Catalysis leads to self-limiting formation of large area monolayer graphene, whereas segregation results in multilayers, which evidently "grow from below." By controlling kinetic factors, dominantly monolayer graphene whose high quality has been confirmed by quantum Hall measurement can be deposited on platinum with hydrogen-rich environment, quench cooling, tiny but continuous methane flow and about 1000°C growth temperature.
UR - http://www.scopus.com/inward/record.url?scp=84899635843&partnerID=8YFLogxK
UR - http://dx.doi.org/10.1063/1.4871978
U2 - 10.1063/1.4871978
DO - 10.1063/1.4871978
M3 - Article
AN - SCOPUS:84899635843
SN - 0003-6951
VL - 104
JO - Applied Physics Letters
JF - Applied Physics Letters
IS - 15
M1 - 152107
ER -