Growth and patterning of amorphous FeSiBC films

C. Shearwood; A. D. Mattingley; M. R.J. Gibbs

doi:10.1016/S0304-8853(96)00257-0

Growth and patterning of amorphous FeSiBC films

C. Shearwood, A. D. Mattingley, M. R.J. Gibbs

University of Sheffield

Research output: Contribution to journal › Article › peer-review

17 Citations (SciVal)

Abstract

We report the growth of amorphous FeSiBC films on a range of substrates including oriented semiconductor, polycrystalline metal, and polyimide. The films vary in thickness from 2.6 μm down to 20 nm and were characterised by the Magneto-Optic Kerr Effect (MOKE), and for the thicker films a combination of MOKE and a high resolution inductive magnetometer. These measurements imply a skin-depth of 30 nm, at the frequency of the MOKE laser. A representative amorphous FeSiBC film of thickness 0.3 μm was patterned into wires of nominal width 10 μm, separation 5 μm, and length 10 mm by conventional microelectronic fabrication techniques. The switching of the wire-array was investigated by MOKE.

Original language	English
Pages (from-to)	147-154
Number of pages	8
Journal	Journal of Magnetism and Magnetic Materials
Volume	162
Issue number	2-3
DOIs	https://doi.org/10.1016/S0304-8853(96)00257-0
Publication status	Published - Sept 1996

Bibliographical note

Funding Information:
Measurements made by Mr R.M. Abraham and S. Dean are acknowledged, together with the X-ray diffraction and electron-probe micro-analysis performed respectively by Mr B. Chapman and Mr H.R. Perrott of Bath University. The financial support of the ESPRC is acknowledged.

Keywords

Amorphous systems - Films
FeSiBC
Magnetoelastic
Microfabrication
MOKE
Sputtering

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

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10.1016/S0304-8853(96)00257-0

Cite this

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title = "Growth and patterning of amorphous FeSiBC films",

abstract = "We report the growth of amorphous FeSiBC films on a range of substrates including oriented semiconductor, polycrystalline metal, and polyimide. The films vary in thickness from 2.6 μm down to 20 nm and were characterised by the Magneto-Optic Kerr Effect (MOKE), and for the thicker films a combination of MOKE and a high resolution inductive magnetometer. These measurements imply a skin-depth of 30 nm, at the frequency of the MOKE laser. A representative amorphous FeSiBC film of thickness 0.3 μm was patterned into wires of nominal width 10 μm, separation 5 μm, and length 10 mm by conventional microelectronic fabrication techniques. The switching of the wire-array was investigated by MOKE.",

keywords = "Amorphous systems - Films, FeSiBC, Magnetoelastic, Microfabrication, MOKE, Sputtering",

author = "C. Shearwood and Mattingley, {A. D.} and Gibbs, {M. R.J.}",

note = "Funding Information: Measurements made by Mr R.M. Abraham and S. Dean are acknowledged, together with the X-ray diffraction and electron-probe micro-analysis performed respectively by Mr B. Chapman and Mr H.R. Perrott of Bath University. The financial support of the ESPRC is acknowledged.",

year = "1996",

month = sep,

doi = "10.1016/S0304-8853(96)00257-0",

language = "English",

volume = "162",

pages = "147--154",

journal = "Journal of Magnetism and Magnetic Materials",

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publisher = "Elsevier",

number = "2-3",

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TY - JOUR

T1 - Growth and patterning of amorphous FeSiBC films

AU - Shearwood, C.

AU - Mattingley, A. D.

AU - Gibbs, M. R.J.

N1 - Funding Information: Measurements made by Mr R.M. Abraham and S. Dean are acknowledged, together with the X-ray diffraction and electron-probe micro-analysis performed respectively by Mr B. Chapman and Mr H.R. Perrott of Bath University. The financial support of the ESPRC is acknowledged.

PY - 1996/9

Y1 - 1996/9

N2 - We report the growth of amorphous FeSiBC films on a range of substrates including oriented semiconductor, polycrystalline metal, and polyimide. The films vary in thickness from 2.6 μm down to 20 nm and were characterised by the Magneto-Optic Kerr Effect (MOKE), and for the thicker films a combination of MOKE and a high resolution inductive magnetometer. These measurements imply a skin-depth of 30 nm, at the frequency of the MOKE laser. A representative amorphous FeSiBC film of thickness 0.3 μm was patterned into wires of nominal width 10 μm, separation 5 μm, and length 10 mm by conventional microelectronic fabrication techniques. The switching of the wire-array was investigated by MOKE.

AB - We report the growth of amorphous FeSiBC films on a range of substrates including oriented semiconductor, polycrystalline metal, and polyimide. The films vary in thickness from 2.6 μm down to 20 nm and were characterised by the Magneto-Optic Kerr Effect (MOKE), and for the thicker films a combination of MOKE and a high resolution inductive magnetometer. These measurements imply a skin-depth of 30 nm, at the frequency of the MOKE laser. A representative amorphous FeSiBC film of thickness 0.3 μm was patterned into wires of nominal width 10 μm, separation 5 μm, and length 10 mm by conventional microelectronic fabrication techniques. The switching of the wire-array was investigated by MOKE.

KW - Amorphous systems - Films

KW - FeSiBC

KW - Magnetoelastic

KW - Microfabrication

KW - MOKE

KW - Sputtering

UR - http://www.scopus.com/inward/record.url?scp=0030565279&partnerID=8YFLogxK

U2 - 10.1016/S0304-8853(96)00257-0

DO - 10.1016/S0304-8853(96)00257-0

M3 - Article

AN - SCOPUS:0030565279

SN - 0304-8853

VL - 162

SP - 147

EP - 154

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

IS - 2-3

ER -

Growth and patterning of amorphous FeSiBC films

Abstract

Bibliographical note

Keywords

ASJC Scopus subject areas

Access to Document

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