The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic((R)) P123 triblock copolymer surfactant also show a strong dependence of mesostructure development oil silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.
|Title of host publication||Recent Advances in the Science and Technology of Zeolites and Related Materials, Pts a - C|
|Number of pages||7|
|Publication status||Published - 2004|
|Name||Studies in Surface Science and Catalysis|
Edler, K. J., Brennan, T., Fernandez-Martin, C., & Roser, S. J. (2004). Formation of mesophase surfactant-templated silica thin films from acidic solutions. In Recent Advances in the Science and Technology of Zeolites and Related Materials, Pts a - C (Vol. 154, pp. 373-379). (Studies in Surface Science and Catalysis).