The formation of mesophase silica-surfactant thin films at the air/solution interface has been studied in situ using off-specular X-ray reflectivity, Brewster angle microscopy and small angle scattering. Results for cetyltrimethylammonium bromide-templated films suggest that the formation mechanism is strongly dependent on the silica:surfactant ratio, and this is confirmed by studies on the subphase solutions using time-resolved small angle X-ray and neutron scattering. Results of similar investigations for films templated with Pluronic((R)) P123 triblock copolymer surfactant also show a strong dependence of mesostructure development oil silica:surfactant ratio. A general formation mechanism for mesophase growth and thin film development is proposed.
|Title of host publication
|Recent Advances in the Science and Technology of Zeolites and Related Materials, Pts a - C
|Number of pages
|Published - 2004
|Studies in Surface Science and Catalysis