Focussed-ion-beam post-processing technology for active devices

Chyng Wen Tee, Fat Kit Lau, Xin Zhao, Richard Penty, Ian White

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Focused ion beam (FIB) etching technology is a highly efficient post-processing technique with the functionality to perform sputter etching and deposition of metals or insulators by means of a computer-generated mask. The high resolution and the ability to remove material directly from the sample in-situ make FIB etching the ideal candidate for device prototyping of novel micro-size photonic component design. Furthermore, the fact that arbitrary profile can be etched directly onto a sample without the need to prepare conventional mask and photolithography process makes novel device research with rapid feedback from characterisation to design activities possible. In this paper, we present a concise summary of the research work in Cambridge based on FIB technology. We demonstrate the applicability of focussed ion beam post processing technology to active photonic devices research. Applications include the integration of advanced waveguide architectures onto active photonic components. We documents details on the integration of lens structure on tapered lasers, photonic crystals on active SOA-integrated waveguides and surface profiling of low-cost gain-guided vertical-cavity surface-emitting lasers. Furthermore, we discuss additional functions of FIB in the measurement of buried waveguide structures or the integration of total-internal-reflection (TIR) mirror in optical interconnect structures.

Original languageEnglish
Title of host publicationOptoelectronic Materials and Devices
DOIs
Publication statusPublished - 27 Dec 2006
EventOptoelectronic Materials and Devices - Gwangju, Korea, Republic of
Duration: 5 Sep 20067 Sep 2006

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume6352 I
ISSN (Print)0277-786X

Conference

ConferenceOptoelectronic Materials and Devices
CountryKorea, Republic of
CityGwangju
Period5/09/067/09/06

Keywords

  • Focussed ion beam etching
  • Lens structure
  • Photonic crystals
  • Photonic integration
  • Post-processing
  • Surface profiling
  • Surface relieved VCSELs
  • Waveguide structures

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Tee, C. W., Lau, F. K., Zhao, X., Penty, R., & White, I. (2006). Focussed-ion-beam post-processing technology for active devices. In Optoelectronic Materials and Devices [635210] (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 6352 I). https://doi.org/10.1117/12.691640