Evidence of 3D and 2D electron transport in amorphous Cu-Ti films

C. Shearwood, D. Greig

    Research output: Contribution to journalArticlepeer-review

    Abstract

    Measurements are presented on the temperature and magnetic field dependences of the electrical resistivity of sputtered amorphous Cu-Ti films in a series of experiments designed to examine possible changes over four decades of thickness. The resistivity of all the films was found to be approximately 230 mu Omega cm, and this, together with selected TEM micrographs, confirmed that the specimens were amorphous, crack-free and homogeneous. The experiments show quite clearly the transition from three-dimensional to two-dimensional behaviour as predicted by models of quantum interference.

    Original languageEnglish
    Article number010
    Pages (from-to)2937-2946
    Number of pages10
    JournalJournal of Physics: Condensed Matter
    Volume3
    Issue number17
    DOIs
    Publication statusPublished - 1991

    ASJC Scopus subject areas

    • General Materials Science
    • Condensed Matter Physics

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