Abstract
Measurements are presented on the temperature and magnetic field dependences of the electrical resistivity of sputtered amorphous Cu-Ti films in a series of experiments designed to examine possible changes over four decades of thickness. The resistivity of all the films was found to be approximately 230 mu Omega cm, and this, together with selected TEM micrographs, confirmed that the specimens were amorphous, crack-free and homogeneous. The experiments show quite clearly the transition from three-dimensional to two-dimensional behaviour as predicted by models of quantum interference.
Original language | English |
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Article number | 010 |
Pages (from-to) | 2937-2946 |
Number of pages | 10 |
Journal | Journal of Physics: Condensed Matter |
Volume | 3 |
Issue number | 17 |
DOIs | |
Publication status | Published - 1991 |
ASJC Scopus subject areas
- General Materials Science
- Condensed Matter Physics