Abstract

The electrodeposition of lead on boron-doped diamond has been studied with a view to identifying the fundamental parameters controlling the sensitivity and lower detection limit in anodic stripping voltammetry. Chronoamperometric transients are used to explore the deposition, indicating a progressive growth mechanism confirmed by ex situ AFM images. Linear sweep ASV experiments show a threshold concentration of ca 10-6 M below which no lead is detected; this is attributed to the need for nucleation of the solid phase on the electrode. Experiments with variable temperature show that this threshold can be usefully lowered at elevated temperatures.

Original languageEnglish
Pages (from-to)1011-1016
Number of pages6
JournalElectroanalysis
Volume15
Issue number12
DOIs
Publication statusPublished - 1 Aug 2003

Keywords

  • Boron-doped diamond
  • Electrodeposition
  • Lead
  • Nucleation and growth
  • Temperature

ASJC Scopus subject areas

  • Analytical Chemistry
  • Electrochemistry

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