Dynamic shadow mask technique: A universal tool for nanoscience

S Egger; A Ilie; Y T Fu; J Chongsathien; D J Kang; M E Welland

doi:10.1021/nl0486822

Dynamic shadow mask technique: A universal tool for nanoscience

S Egger, A Ilie, Y T Fu, J Chongsathien, D J Kang, M E Welland

Department of Physics

Research output: Contribution to journal › Article › peer-review

81 Citations (SciVal)

Abstract

A comprehensive instrument, designed for fabricating nanostructures by evaporation through a dynamic shadow mask in ultrahigh vacuum, is described. The versatility and performance of the instrument is demonstrated through a series of examples, allowing for applications that are impossible to achieve with traditional nanopatterning methods. Clean nanostructures or entire devices made of different materials and on various substrates can be fabricated. The technique is compatible with fundamental surface science and can be easily interfaced with other fabrication and characterization techniques.

Original language	English
Pages (from-to)	15-20
Number of pages	6
Journal	Nano Letters
Volume	5
Issue number	1
DOIs	https://doi.org/10.1021/nl0486822
Publication status	Published - 2005

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ID number: ISI:000226327600004

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10.1021/nl0486822

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title = "Dynamic shadow mask technique: A universal tool for nanoscience",

abstract = "A comprehensive instrument, designed for fabricating nanostructures by evaporation through a dynamic shadow mask in ultrahigh vacuum, is described. The versatility and performance of the instrument is demonstrated through a series of examples, allowing for applications that are impossible to achieve with traditional nanopatterning methods. Clean nanostructures or entire devices made of different materials and on various substrates can be fabricated. The technique is compatible with fundamental surface science and can be easily interfaced with other fabrication and characterization techniques.",

author = "S Egger and A Ilie and Fu, {Y T} and J Chongsathien and Kang, {D J} and Welland, {M E}",

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AU - Egger, S

AU - Ilie, A

AU - Fu, Y T

AU - Chongsathien, J

AU - Kang, D J

AU - Welland, M E

N1 - ID number: ISI:000226327600004

PY - 2005

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N2 - A comprehensive instrument, designed for fabricating nanostructures by evaporation through a dynamic shadow mask in ultrahigh vacuum, is described. The versatility and performance of the instrument is demonstrated through a series of examples, allowing for applications that are impossible to achieve with traditional nanopatterning methods. Clean nanostructures or entire devices made of different materials and on various substrates can be fabricated. The technique is compatible with fundamental surface science and can be easily interfaced with other fabrication and characterization techniques.

AB - A comprehensive instrument, designed for fabricating nanostructures by evaporation through a dynamic shadow mask in ultrahigh vacuum, is described. The versatility and performance of the instrument is demonstrated through a series of examples, allowing for applications that are impossible to achieve with traditional nanopatterning methods. Clean nanostructures or entire devices made of different materials and on various substrates can be fabricated. The technique is compatible with fundamental surface science and can be easily interfaced with other fabrication and characterization techniques.

U2 - 10.1021/nl0486822

DO - 10.1021/nl0486822

M3 - Article

SN - 1530-6984

VL - 5

SP - 15

EP - 20

JO - Nano Letters

JF - Nano Letters

IS - 1

ER -

Dynamic shadow mask technique: A universal tool for nanoscience

Abstract

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