Dual source atmospheric pressure chemical vapour deposition of TiP films on glass using TiCl4 and PH2But

C Blackman, C J Carmalt, S A O'Neill, I P Parkin, L Apostilco, K C Molloy

Research output: Contribution to journalArticlepeer-review

19 Citations (SciVal)

Abstract

A facile new method for the preparation of large area titanium phosphide films on glass is described from the atmospheric pressure chemical vapour deposition of titanium tetrachloride and tert-butylphosphine.
Original languageEnglish
Pages (from-to)2408-2409
Number of pages2
JournalJournal of Materials Chemistry
Volume11
Issue number10
Publication statusPublished - 2001

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