Abstract

We describe a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. In this way, we can create different periodic patterns in short timescales using a single mask with no mask degradation. We demonstrate multiple exposures, combined with discrete lateral displacements, and single exposures, with continuous displacements, to achieve image inversion, pitch reduction, and nanogaps between metal nanoparticles. Our approach provides a flexible route to create large-area nanopatterned materials and devices in high volumes.

Original languageEnglish
Pages (from-to)32037-32046
Number of pages10
JournalOptics Express
Volume27
Issue number22
DOIs
Publication statusPublished - 28 Oct 2019

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

“Double” displacement Talbot lithography : Fast, wafer-scale, direct-writing of complex periodic nanopatterns. / Chausse, Pierre; Boulbar, Emmanuel Le; Coulon, Pierre Marie; Shields, Philip A.

In: Optics Express, Vol. 27, No. 22, 28.10.2019, p. 32037-32046.

Research output: Contribution to journalArticle

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