Abstract
We describe a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. In this way, we can create different periodic patterns in short timescales using a single mask with no mask degradation. We demonstrate multiple exposures, combined with discrete lateral displacements, and single exposures, with continuous displacements, to achieve image inversion, pitch reduction, and nanogaps between metal nanoparticles. Our approach provides a flexible route to create large-area nanopatterned materials and devices in high volumes.
| Original language | English |
|---|---|
| Pages (from-to) | 32037-32046 |
| Number of pages | 10 |
| Journal | Optics Express |
| Volume | 27 |
| Issue number | 22 |
| DOIs | |
| Publication status | Published - 28 Oct 2019 |
ASJC Scopus subject areas
- Atomic and Molecular Physics, and Optics
Cite this
“Double” displacement Talbot lithography : Fast, wafer-scale, direct-writing of complex periodic nanopatterns. / Chausse, Pierre; Boulbar, Emmanuel Le; Coulon, Pierre Marie; Shields, Philip A.
In: Optics Express, Vol. 27, No. 22, 28.10.2019, p. 32037-32046.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - “Double” displacement Talbot lithography
T2 - Fast, wafer-scale, direct-writing of complex periodic nanopatterns
AU - Chausse, Pierre
AU - Boulbar, Emmanuel Le
AU - Coulon, Pierre Marie
AU - Shields, Philip A.
PY - 2019/10/28
Y1 - 2019/10/28
N2 - We describe a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. In this way, we can create different periodic patterns in short timescales using a single mask with no mask degradation. We demonstrate multiple exposures, combined with discrete lateral displacements, and single exposures, with continuous displacements, to achieve image inversion, pitch reduction, and nanogaps between metal nanoparticles. Our approach provides a flexible route to create large-area nanopatterned materials and devices in high volumes.
AB - We describe a new low-cost nanolithographic tool for creating periodic arrays of complex, nano-motifs, across large areas within minutes. Displacement Talbot lithography is combined with lateral nanopositioning to enable large-area patterning with the flexibility of a direct-write system. In this way, we can create different periodic patterns in short timescales using a single mask with no mask degradation. We demonstrate multiple exposures, combined with discrete lateral displacements, and single exposures, with continuous displacements, to achieve image inversion, pitch reduction, and nanogaps between metal nanoparticles. Our approach provides a flexible route to create large-area nanopatterned materials and devices in high volumes.
UR - http://www.scopus.com/inward/record.url?scp=85074345138&partnerID=8YFLogxK
U2 - 10.1364/OE.27.032037
DO - 10.1364/OE.27.032037
M3 - Article
VL - 27
SP - 32037
EP - 32046
JO - Optics Express
JF - Optics Express
SN - 1094-4087
IS - 22
ER -